[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - A pulsed ion source by non metal shunting arc discharge

• 作者Yukimura, K.; Masamune, S.; Isono, R.; Monguchi, T.; Yashioka, K.
• 卷第1卷
• 文件大小377.91KB
• 发表时间1998
• DOI10.1109/iit.1999.812133
• 页码381-384