[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Dopant channeling as a function of implant angle for low energy applications
Walther, S.R.; Mehta, S.; Weeman, J.; Grouillet, A.; Brown, D.
- 作者Walther, S.R.; Mehta, S.; Weeman, J.; Grouillet, A.; Brown, D.
- 卷第1卷
- 文件大小324.33KB
- 发表时间1998
- DOI10.1109/iit.1999.812068
- 页码126-129