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[IEEE International Caracas Conference on Devices, Circuits and Systems - Isla de Margarita, Venezuela (2-4 March 1998)] Proceedings of the 1998 Second IEEE International Caracas Conference on Devices, Circuits and Systems. ICCDCS 98. On the 70th Anniversary of the MOSFET and 50th of the BJT. (Cat. No.98TH8350) - Integration of multi-level copper metallization into a high performance sub-0.25 μm CMOS technology

[IEEE International Caracas Conference on Devices, Circuits and Systems - Isla de Margarita, Venezuela (2-4 March 1998)] Proceedings of the 1998 Second IEEE International Caracas Conference on Devices, Circuits and Systems. ICCDCS 98. On the 70th Anniversary of the MOSFET and 50th of the BJT. (Cat. No.98TH8350) - Integration of multi-level copper metallization into a high performance sub-0.25 μm CMOS technology

Venkatesan, S.; Venkatraman, R.; Jain, A.; Mendonca, J.; Anderson, S.; Angyal, M.; Capasso, C.; Cope, J.; Crabtree, P.; Das, S.; Farkas, J.; Filipiak, S.; Fiordalice, B.; Hamilton, G.; Herrick, M.; Kawasaki, H.; Islam, R.; King, C.; Klein, J.; Lii, T.; Misra, V.; Reid, K.; Simpson, C.; Smith, B.; Sparks, T.; Watts, D.; Weitzman, E.J.; Wilson, B.
  • 作者Venkatesan, S.; Venkatraman, R.; Jain, A.; Mendonca, J.; Anderson, S.; Angyal, M.; Capasso, C.; Cope, J.; Crabtree, P.; Das, S.; Farkas, J.; Filipiak, S.; Fiordalice, B.; Hamilton, G.; Herrick, M.; Kawasaki, H.; Islam, R.; King, C.; Klein, J.; Lii, T.; Misra, V.; Reid, K.; Simpson, C.; Smith, B.; Sparks, T.; Watts, D.; Weitzman, E.J.; Wilson, B.
  • 文件大小895.37KB
  • 发表时间1998
  • DOI10.1109/iccdcs.1998.705823
  • 页码146-152
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