Influencs of Surface V/III Ratio on the Film Quality during the GaN Growth in Gas-Source Molecular Beam Epitaxy
Shen, Xu-Qiang; Tanaka, Satoru; Iwai, Sohachi; Aoyagi, Yoshinobu
- 期刊名称Japanese Journal of Applied Physics
- 作者Shen, Xu-Qiang; Tanaka, Satoru; Iwai, Sohachi; Aoyagi, Yoshinobu
- 卷第37卷
- 印刷ISSN0021-4922
- 文件大小251.93KB
- 发表时间1998-6-1
- DOI10.1143/JJAP.37.L637