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Effects of substrate temperature on the properties of In0.48Ga0.52P grown by molecular-beam epitaxy using a valved phosphorus cracker cell

Effects of substrate temperature on the properties of In0.48Ga0.52P grown by molecular-beam epitaxy using a valved phosphorus cracker cell

S.F Yoon; K.W Mah; H.Q Zheng; P.H Zhang
  • 作者S.F Yoon; K.W Mah; H.Q Zheng; P.H Zhang
  • 卷第191卷
  • 期第4期
  • 印刷ISSN0022-0248
  • 文件大小112.08KB
  • 发表时间1998
  • DOI10.1016/s0022-0248(98)00386-8
  • 页码613-620
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