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Poly(chloro-p-xylylene)/SiO2 multilayer thin films deposited near-room temperature by thermal CVD

Poly(chloro-p-xylylene)/SiO2 multilayer thin films deposited near-room temperature by thermal CVD

Jay J. Senkevich; Seshu B. Desu
  • 作者Jay J. Senkevich; Seshu B. Desu
  • 卷第322卷
  • 印刷ISSN0040-6090
  • 文件大小326.84KB
  • 发表时间1998
  • DOI10.1016/s0040-6090(97)00918-8
  • 页码148-157
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