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[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - The distribution of residual gas in an ion-implant chamber

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - The distribution of residual gas in an ion-implant chamber

LaFontaine, M.; Tokoro, N.
  • 作者LaFontaine, M.; Tokoro, N.
  • 卷第1卷
  • 文件大小353.74KB
  • 发表时间1998
  • DOI10.1109/iit.1999.812186
  • 页码594-597
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