Lithographic performance of 193 nm single and bi-layer materials.

Goethals, A.M.; Pollers, I.; Roey, F. van; Sugihara, T.; Ronse, K.; Driessche, V. van; Tzviatkov, P.; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R.

期刊名称Journal of Photopolymer Science and Technology
作者Goethals, A.M.; Pollers, I.; Roey, F. van; Sugihara, T.; Ronse, K.; Driessche, V. van; Tzviatkov, P.; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R.
卷第11卷
期第3期
印刷ISSN0914-9244
电子ISSN1349-6336
文件大小1534.01KB
发表时间1998
DOI10.2494/photopolymer.11.513
页码513-523

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Lithographic performance of 193 nm single and bi-layer materials.