[ASCE STRESS INDUCED PHENOMENA IN METALLIZATION - Tokyo (Japan) (4-6 Jun 1997)] Fourth international workshop on stress induced phenomena in metallization - Diffusion barriers between Si and Cu
Mori, Hidetsugu; Imahori, Junji; Oku, Takeo; Murakami, Masanori
- 作者Mori, Hidetsugu; Imahori, Junji; Oku, Takeo; Murakami, Masanori
- 文件大小590.26KB
- 发表时间1998
- DOI10.1063/1.54670
- 页码475-480