Novel facing targets sputtering apparatus with uniform magnetic field and plasma-free substrates

• 作者Kohki Noda; Toyoaki Hirata; Takashi Kawanabe; Masahiko Naoe
• 卷第51卷
• 期第4期
• 印刷ISSN0042-207X
• 文件大小438.44KB
• 发表时间1998
• DOI10.1016/s0042-207x(98)00275-9
• 页码687-690