发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

A molecular dynamics simulation of ultrathin oxide films on silicon: Growth by thermal O atoms and sputtering by 100 eV Ar+ ions

A molecular dynamics simulation of ultrathin oxide films on silicon: Growth by thermal O atoms and sputtering by 100 eV Ar+ ions

Kubota, A.; Economou, D.J.

作者Kubota, A.; Economou, D.J.
卷第27卷
期第5期
印刷ISSN0093-3813
电子ISSN1939-9375
文件大小449.97KB
发表时间1999
DOI10.1109/27.799820
页码1416-1425

← 返回【学霸图书馆】主页