Structural characterization of radiofrequency magnetron sputter deposited SiO
2
thin films
Li, Boquan; Fujimoto, Toshiyuki; Kojima, Isao
- 期刊名称Journal of Physics D: Applied Physics
- 作者Li, Boquan; Fujimoto, Toshiyuki; Kojima, Isao
- 卷第32卷
- 期第12期
- 印刷ISSN0022-3727
- 电子ISSN1361-6463
- 文件大小129.95KB
- 发表时间1999-06-21
- DOI10.1088/0022-3727/32/12/302
- 页码1287-1292