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[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Effect of plasma density and uniformity, electron temperature, process gas, and chamber on electron shading damage

[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Effect of plasma density and uniformity, electron temperature, process gas, and chamber on electron shading damage

Siu, S.; Patrick, R.; Vahedi, V.; Alba, S.; Valentini, G.; Colombo, P.
  • 作者Siu, S.; Patrick, R.; Vahedi, V.; Alba, S.; Valentini, G.; Colombo, P.
  • 文件大小248.71KB
  • 发表时间1999
  • DOI10.1109/ppid.1999.798800
  • 页码25-28
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