Deposition of ultrapure hydrogenated amorphous silicon
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Kamei, Toshihiro; Matsuda, Akihisa
- 卷第17卷
- 期第1期
- 印刷ISSN0734-2101
- 文件大小872.00KB
- 发表时间1999
- DOI10.1116/1.581559
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