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Maskless micro-ion-beam reduction lithography

Maskless micro-ion-beam reduction lithography

V. V. Ngo; W. Barletta; R. Gough; Y. Lee; K. N. Leung; N. Zahir; D. Patterson

作者V. V. Ngo; W. Barletta; R. Gough; Y. Lee; K. N. Leung; N. Zahir; D. Patterson
文件大小911.63KB
发表时间1999
DOI10.1116/1.591065

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