Reactions and diffusion during annealing-induced H+ generation in SOI buried oxides

• 作者K. Vanheusden; D.M. Fleetwood; R.A.B. Devine; W.L. Warren
• 卷第48卷
• 印刷ISSN0167-9317
• 文件大小404.14KB
• 发表时间1999
• DOI10.1016/s0167-9317(99)00406-2
• 页码363-366