Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution
- 作者H.L Hsiao; H.L Hwang; A.B Yang; L.W Chen; T.R Yew
- 卷第142卷
- 印刷ISSN0169-4332
- 文件大小448.10KB
- 发表时间1999
- DOI10.1016/s0169-4332(98)00701-6
- 页码316-321
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