Fabrication of SiO2/c-Si/SiO2 Double Barrier Structure Using Lateral Solid Phase Epitaxy
- 期刊名称Physica Scripta
- 作者Novikov, S. V.; Sinkkonen, J.
- 期第1期
- 印刷ISSN0031-8949
- 文件大小272.95KB
- 发表时间1999
- DOI10.1238/physica.topical.079a00213
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