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Structural and optoelectronic properties of amorphous and microcrystalline silicon deposited at low substrate temperatures by RF and HW CVD

Structural and optoelectronic properties of amorphous and microcrystalline silicon deposited at low substrate temperatures by RF and HW CVD

Alpuim, P.; Chu, V.; Conde, J. P.

期刊名称MRS Proceedings
作者Alpuim, P.; Chu, V.; Conde, J. P.
卷第557卷
电子ISSN1946-4274
文件大小403.93KB
发表时间1999-1
DOI10.1557/proc-557-91

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