Development of Novel Photoresist Polymer.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Miyake, Hiroto; Tanigawa, Hiroto; Okumura, Koichi; Nagashima, Yasuhiro; Maruo, Katsuya; Kobayashi, Kenji; Fukui, Yoshitaka
- 卷第12卷
- 期第1期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小170.52KB
- 发表时间1999
- DOI10.2494/photopolymer.12.173
- 页码173-176
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