Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation
J.W Swart; J.A Diniz; I Doi; M.A.B de Moraes
- 作者J.W Swart; J.A Diniz; I Doi; M.A.B de Moraes
- 印刷ISSN0168-583X
- 文件大小166.55KB
- 发表时间2000
- DOI10.1016/s0168-583x(99)00650-3
- 页码171-176