[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Junction capacitance reduction by S/D junction compensation implant
Curello, C.; Rengarajan, R.; Faul, J.; Kieslich, A.; Glawischnig, H.
- 作者Curello, C.; Rengarajan, R.; Faul, J.; Kieslich, A.; Glawischnig, H.
- 文件大小413.54KB
- 发表时间2000
- DOI10.1109/.2000.924086
- 页码46-49