[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Implant charging dependence on photo resist bake and electron flood gun
Romig, T.; King Chao, ; Rendon, M.J.; Azrack, M.
- 作者Romig, T.; King Chao, ; Rendon, M.J.; Azrack, M.
- 文件大小257.37KB
- 发表时间2000
- DOI10.1109/.2000.924213
- 页码558-560