Surface production of CF, CF[sub 2], and C[sub 2] radicals in high-density CF[sub 4]/H[sub 2] plasmas
- 期刊名称Journal of Applied Physics
- 作者Sasaki, K.; Furukawa, H.; Kadota, K.; Suzuki, C.
- 卷第88卷
- 期第10期
- 印刷ISSN0021-8979
- 文件大小349.05KB
- 发表时间2000
- DOI10.1063/1.1319974
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