[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - In situ charging potential monitoring for a high current ribbon beam
- 作者Radovanov, S.; Liebert, R.; Corey, P.; Cummings, J.; Angel, G.; Buff, J.
- 文件大小331.85KB
- 发表时间2000
- DOI10.1109/.2000.924218
- 页码577-580
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