[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Implant dosimetry results for plasma doping

• 作者Walther, S.; Lenoble, D.; Ziwei Fang, ; Liebert, R.B.
• 文件大小354.00KB
• 发表时间2000
• DOI10.1109/.2000.924195
• 页码492-495