Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN _x Gate Formation

• 期刊名称Japanese Journal of Applied Physics
• 作者Moriwaki, Masaru; Yamada, Takayuki; Harada, Yoshinao; Fujii, Shinji; Yamanaka, Michinari; Shibata, Jun; Mori, Yoshihiro
• 卷第39卷
• 印刷ISSN0021-4922
• 电子ISSN1347-4065
• 文件大小271.90KB
• 发表时间2000-4-30
• DOI10.1143/JJAP.39.2177
• 页码2177-2180