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Inter- and intramembrane resist critical dimension uniformity across a SCALPEL mask

Inter- and intramembrane resist critical dimension uniformity across a SCALPEL mask

K. Nordquist; E. Ainley; D. J. Resnick; E. Weisbrod; C. Martin; R. Engelstad; Z. Masnyj; P. Mangat
  • 作者K. Nordquist; E. Ainley; D. J. Resnick; E. Weisbrod; C. Martin; R. Engelstad; Z. Masnyj; P. Mangat
  • 文件大小838.99KB
  • 发表时间2000
  • DOI10.1116/1.1324642
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