Highly sensitive positive surface modification resists
- 作者M. Shirai; M. Endo; M. Tsunooka; M. Endo
- 卷第53卷
- 印刷ISSN0167-9317
- 文件大小422.38KB
- 发表时间2000
- DOI10.1016/s0167-9317(00)00359-2
- 页码475-478
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