[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Two implant measurement of pressure compensation factors

• 作者Halling, M.
• 文件大小279.41KB
• 发表时间2000
• DOI10.1109/iit.2000.924220
• 页码585-587