The Effect of Forming Gas Annealing on Pt/(Ba,Sr)TiO3/Pt Thin Film Capacitors for Future Dram Applications: Electrical Properties and Degradation Mechanisms

• 期刊名称MRS Proceedings
• 作者Baniecki, J. D.; Parks, C.; Laibowitz, R.B.; Shaw, T. M.; Lian, J.
• 卷第655卷
• 电子ISSN1946-4274
• 文件大小169.81KB
• 发表时间2000-1
• DOI10.1557/proc-655-cc6.1.1