SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Increasing degree of homogeneity of electrical parameters of neutron-transmuted silicon
- 作者Makhkamov, Shermakhmat; Burnett, David; Kimura, Shin'ichiro; Tursunov, Nigmatilla A.; Ashurov, Maripjon; Singh, Bhanwar; Khakimov, Zokirkhon M.
- 卷第4181卷
- 印刷ISSN0277-786X
- 文件大小85.16KB
- 发表时间2000
- DOI10.1117/12.395740
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