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The Importance of OH groups Containing in Solid Films for High Sensitivity of Chemically Amplified Resists.

The Importance of OH groups Containing in Solid Films for High Sensitivity of Chemically Amplified Resists.

Hirano, Yoshinori; Ohmori, Norihito; Okimoto, Noriaki; Hata, Masayuki; Hoshino, Tyuji; Tsuda, Minoru
  • 期刊名称Journal of Photopolymer Science and Technology
  • 作者Hirano, Yoshinori; Ohmori, Norihito; Okimoto, Noriaki; Hata, Masayuki; Hoshino, Tyuji; Tsuda, Minoru
  • 卷第13卷
  • 期第4期
  • 印刷ISSN0914-9244
  • 电子ISSN1349-6336
  • 文件大小249.45KB
  • 发表时间2000
  • DOI10.2494/photopolymer.13.503
  • 页码503-506
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