Bilayer resists for DUV lithography.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Tai, M. C.; Fang, M. C.; Chang, J. F.; Lin, T. Y.; Liu, T. C.; Chuang, C. S.; Cheng, H. B.; Jean, T. S.
- 卷第13卷
- 期第4期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小236.15KB
- 发表时间2000
- DOI10.2494/photopolymer.13.525
- 页码525-529
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