00/00357 Effect of annealing on the electrical, optical and structural properties of hydrogenated amorphous silicon films deposited in an asymmetric R.F. plasma CVD system at room temperature

• 卷第41卷
• 期第1期
• 印刷ISSN0140-6701
• 文件大小220.50KB
• 发表时间2000
• DOI10.1016/s0140-6701(00)95147-6