Effects of thickness on the electrical properties of metalorganic chemical vapor deposited Pb(Zr,âTi)O[sub 3] (25â100 nm) thin films on LaNiO[sub 3] buffered Si
Lin, C. H.; Friddle, P. A.; Ma, C. H.; Daga, A.; Chen, Haydn
- 期刊名称Journal of Applied Physics
- 作者Lin, C. H.; Friddle, P. A.; Ma, C. H.; Daga, A.; Chen, Haydn
- 卷第90卷
- 期第3期
- 印刷ISSN0021-8979
- 文件大小356.25KB
- 发表时间2001
- DOI10.1063/1.1383262