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Etching mechanism of Y[sub 2]O[sub 3] thin films in high density Cl[sub 2]/Ar plasma

Etching mechanism of Y[sub 2]O[sub 3] thin films in high density Cl[sub 2]/Ar plasma

Y. Kim; C. Kim

作者Y. Kim; C. Kim
文件大小343.42KB
发表时间2001
DOI10.1116/1.1399316

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