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Comparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems

Comparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems

Liu, J. F.; Feng, J. Y.; Zhu, J.

期刊名称Journal of Applied Physics
作者Liu, J. F.; Feng, J. Y.; Zhu, J.
卷第90卷
期第2期
印刷ISSN0021-8979
文件大小455.55KB
发表时间2001
DOI10.1063/1.1379053

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