![Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime]()
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regimeZhang, Yu-Ru; Tinck, Stefan; Schepper, Peter De; Wang, You-Nian; Bogaerts, Annemie · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2015