A study on the formation and characteristics of the SiOCH composite thin films with low dielectric constant for advanced semiconductor devices
- 作者Chang Shil Yang; Kyoung Suk Oh; Jai Yon Ryu; Doo Chul Kim; Jing Shou-Yong; Chi Kyu Choi; Heon-Ju Lee; Se Hun Um; Hong Young Chang
- 卷第390卷
- 印刷ISSN0040-6090
- 文件大小197.79KB
- 发表时间2001
- DOI10.1016/s0040-6090(01)00931-2
- 页码113-118
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