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Study of aluminum and gold as the gate electrode material on silicon nitride based MIS devices

Study of aluminum and gold as the gate electrode material on silicon nitride based MIS devices

Mohua Bose; D.K Basa; D.N Bose
  • 作者Mohua Bose; D.K Basa; D.N Bose
  • 卷第171卷
  • 印刷ISSN0169-4332
  • 文件大小127.60KB
  • 发表时间2001
  • DOI10.1016/s0169-4332(00)00557-2
  • 页码130-135
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