Suppressing the surface roughness and columnar growth of silicon nitride films
Wentao Xu; Boquan Li; Toshiyuki Fujimoto; Isao Kojima
- 作者Wentao Xu; Boquan Li; Toshiyuki Fujimoto; Isao Kojima
- 卷第135卷
- 印刷ISSN0257-8972
- 文件大小337.64KB
- 发表时间2001
- DOI10.1016/s0257-8972(00)01070-7
- 页码274-278