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Surfactant-assisted atomic-level engineering of spin valves

Surfactant-assisted atomic-level engineering of spin valves

Chopra, Harsh Deep; Yang, David X.; Chen, P. J.; Egelhoff, W. F.

期刊名称Physical Review B
作者Chopra, Harsh Deep; Yang, David X.; Chen, P. J.; Egelhoff, W. F.
卷第65卷
期第9期
印刷ISSN0163-1829
电子ISSN1095-3795
文件大小581.65KB
发表时间2002-2-21
DOI10.1103/PhysRevB.65.094433

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