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Dislocation behavior in heavily germanium-doped silicon crystal

Dislocation behavior in heavily germanium-doped silicon crystal

Toshinori Taishi; Xinming Huang; Ichiro Yonenaga; Keigo Hoshikawa

作者Toshinori Taishi; Xinming Huang; Ichiro Yonenaga; Keigo Hoshikawa
卷第5卷
印刷ISSN1369-8001
文件大小227.65KB
发表时间2002
DOI10.1016/s1369-8001(02)00128-2
页码409-412

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