Wavelet-based uniformity of plasma etching surface
Byungwhan Kim, ; Sungmo Kim, ; Myo Taeg Lim,
- 期刊名称IEEE Transactions on Plasma Science
- 作者Byungwhan Kim, ; Sungmo Kim, ; Myo Taeg Lim,
- 卷第31卷
- 期第6期
- 印刷ISSN0093-3813
- 文件大小1043.60KB
- 发表时间2003-12
- DOI10.1109/TPS.2003.820967
- 页码1313-1316