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[IEEE 2003 8th International Symposium on Plasma- and Process-Induced Damage - Corbeil-Essonnes, France (24-25 April 2003)] 2003 8th International Symposium Plasma- and Process-Induced Damage. - NBTI in dual gate oxide PMOSFETs

[IEEE 2003 8th International Symposium on Plasma- and Process-Induced Damage - Corbeil-Essonnes, France (24-25 April 2003)] 2003 8th International Symposium Plasma- and Process-Induced Damage. - NBTI in dual gate oxide PMOSFETs

Chaparala, P.; Brisbin, D.; Shibley, J.

作者Chaparala, P.; Brisbin, D.; Shibley, J.
文件大小352.39KB
发表时间2003
DOI10.1109/ppid.2003.1200942
页码138-141

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