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Influence of working gas pressure on structure and properties of WO[sub 3] films reactively deposited by rf magnetron sputtering

Influence of working gas pressure on structure and properties of WO[sub 3] films reactively deposited by rf magnetron sputtering

T. Takahashi; J. Tanabe; N. Yamada; H. Nakabayashi

作者T. Takahashi; J. Tanabe; N. Yamada; H. Nakabayashi
文件大小407.91KB
发表时间2003
DOI10.1116/1.1575216

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