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Density functional theory study of HfCl[sub 4], ZrCl[sub 4], and Al(CH[sub 3])[sub 3] decomposition on hydroxylated SiO[sub 2]: Initial stage of high-k atomic layer deposition

Density functional theory study of HfCl[sub 4], ZrCl[sub 4], and Al(CH[sub 3])[sub 3] decomposition on hydroxylated SiO[sub 2]: Initial stage of high-k atomic layer deposition

Jeloaica, L.; Estève, A.; Djafari Rouhani, M.; Estève, D.

期刊名称Applied Physics Letters
作者Jeloaica, L.; Estève, A.; Djafari Rouhani, M.; Estève, D.
卷第83卷
期第3期
印刷ISSN0003-6951
文件大小366.54KB
发表时间2003
DOI10.1063/1.1587261

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