![[IEEE 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Smolenice, Slovakia (2006.10.16-2006.10.18)] 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Superior nMOSFET scalability using Fluorineine co-implantation and spike annealing]()
[IEEE 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Smolenice, Slovakia (2006.10.16-2006.10.18)] 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Superior nMOSFET scalability using Fluorineine co-implantation and spike annealingKubicek, S.; Hoffmann, T.; Augendre, E.; Pawlak, B.; Chiarella, T.; Kerner, C.; Severi, S.; Falepin, A.; De Keersgieter, A.; Noda, T.; Jurczak, M.; Absil, P.; Biesemans, S. · 2006