Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology [Electrochemical and Solid-State Letters, 6, G69 (2003)]
Chang, T. C.; Tsai, T. M.; Liu, P. T.; Mor, Y. S.; Chen, C. W.; Sheu, J. T.; Tseng, T. Y.
- 期刊名称Electrochemical and Solid-State Letters
- 作者Chang, T. C.; Tsai, T. M.; Liu, P. T.; Mor, Y. S.; Chen, C. W.; Sheu, J. T.; Tseng, T. Y.
- 卷第6卷
- 期第7期
- 印刷ISSN1099-0062
- 文件大小23.58KB
- 发表时间2003
- DOI10.1149/1.1576571