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Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology [Electrochemical and Solid-State Letters, 6, G69 (2003)]

Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology [Electrochemical and Solid-State Letters, 6, G69 (2003)]

Chang, T. C.; Tsai, T. M.; Liu, P. T.; Mor, Y. S.; Chen, C. W.; Sheu, J. T.; Tseng, T. Y.
  • 期刊名称Electrochemical and Solid-State Letters
  • 作者Chang, T. C.; Tsai, T. M.; Liu, P. T.; Mor, Y. S.; Chen, C. W.; Sheu, J. T.; Tseng, T. Y.
  • 卷第6卷
  • 期第7期
  • 印刷ISSN1099-0062
  • 文件大小23.58KB
  • 发表时间2003
  • DOI10.1149/1.1576571
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